Integration of non-etchback low-k methy silsequioxane polymer using electron beam cure

Gao, TengTengGaoCoenegrachts, BartBartCoenegrachtsWaeterloos, JoostJoostWaeterloosVan Hove, MarleenMarleenVan HoveMaex, KarenKarenMaexYang, JipingJipingYangWang, SharonSharonWangForester, LynnLynnForester2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3458Integration of non-etchback low-k methy silsequioxane polymer using electron beam cureProceedings paper