De Simone, DaniloDaniloDe SimoneVesters, YannickYannickVestersVandenberghe, GeertGeertVandenberghe2021-10-242021-10-2420172192-8584https://imec-publications.be/handle/20.500.12860/28160Photoresists in extreme ultraviolet lithographyJournal articlehttps://www.degruyter.com/view/j/aot.2017.6.issue-3-4/aot-2017-0021/aot-2017-0021.xml?format=INT