Contact edge roughness: effects of dose and PAG concentration in EUV lithography

Kuppuswamy, Vijaya Kumar MurugesanVijaya Kumar MurugesanKuppuswamyConstantoudis, VassiliosVassiliosConstantoudisGogolides, EvangelosEvangelosGogolidesVaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheid2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19208Contact edge roughness: effects of dose and PAG concentration in EUV lithographyOral presentation