Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations

Finders, JoJoFindersDusa, MirceaMirceaDusaVleeming, BertBertVleemingHepp, BirgittBirgittHeppMaenhoudt, MireilleMireilleMaenhoudtCheng, ShauneeShauneeChengVandeweyer, TomTomVandeweyer2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15310Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerationsJournal articlehttp://spiedl.aip.org/