Engineering of a TiN\Al2O3\(Hf,Al)O2\Ta2O5\Hf RRAM cell for fast operation at low current

Chen, MichaelMichaelChenGoux, LudovicLudovicGouxFantini, AndreaAndreaFantiniDegraeve, RobinRobinDegraeveRedolfi, AugustoAugustoRedolfiGroeseneken, GuidoGuidoGroesenekenJurczak, GosiaGosiaJurczak2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25065Engineering of a TiN\Al2O3\(Hf,Al)O2\Ta2O5\Hf RRAM cell for fast operation at low currentProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7324764