Kondoh, EiichiEiichiKondohBaklanov, MikhaïlMikhaïlBaklanovMaex, KarenKarenMaex2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3569Characterization of HF-last cleaning of ion-implanted Si surfacesProceedings paper