Characterization of the Mechanical Stress induced during Silicidation in sub-0.25μm MOS Technologies

Steegen, AnAnSteegen2021-10-142021-10-142001-01https://imec-publications.be/handle/20.500.12860/5673Characterization of the Mechanical Stress induced during Silicidation in sub-0.25μm MOS TechnologiesPHD thesis