Evaluations of intrinsic time dependent dielectric breakdown of dielectric copper diffusion barriers

Zhao, LarryLarryZhaoLofrano, MelinaMelinaLofranoCroes, KristofKristofCroesVan Besien, ElsElsVan BesienTokei, ZsoltZsoltTokeiWilson, ChrisChrisWilsonDegraeve, RobinRobinDegraeveKauerauf, ThomasThomasKaueraufBeyer, GeraldGeraldBeyerClaeys, CorCorClaeys2021-10-192021-10-1920110040-6090https://imec-publications.be/handle/20.500.12860/20221Evaluations of intrinsic time dependent dielectric breakdown of dielectric copper diffusion barriersJournal article