3D FinFET gate etch for advanced CMOS scaling

Dupuy, EmmanuelEmmanuelDupuyAltamirano Sanchez, EfrainEfrainAltamirano SanchezMarinov, DaniilDaniilMarinovHody, HubertHubertHodyMertens, HansHansMertensSiew, Yong KongYong KongSiewDemuynck, StevenStevenDemuynckHoriguchi, NaotoNaotoHoriguchi2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/329223D FinFET gate etch for advanced CMOS scalingOral presentationhttp://pesm2019.insight-outside.fr/index.php?langue=en&onglet=11&acces=&idUser=&emailUser=&messageConfirmation=