Evolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structures

Blachut, GregoryGregoryBlachutSirard, StephenStephenSirardLiang, AndrewAndrewLiangMack, ChrisChrisMackMaher, MichaelMichaelMaherRincon Delgadillo, PaulinaPaulinaRincon DelgadilloChan, BTBTChanMannaert, GeertGeertMannaertVandenberghe, GeertGeertVandenbergheWillson, GrantGrantWillsonEllison, ChristopherChristopherEllisonHymes, DianeDianeHymes2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30258Evolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structuresProceedings paperhttps://doi.org/10.1117/12.2297489