Unraveling the effect of resist composition on EUV optics contamination

Pollentier, IvanIvanPollentierNeira, ImanolImanolNeiraGoethals, MiekeMiekeGoethalsGronheid, RoelRoelGronheidTarutani, S.S.TarutaniTamaoki, H.H.TamaokiTakahashi, T.T.TakahashiTsubaki, H.H.Tsubaki2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19587Unraveling the effect of resist composition on EUV optics contaminationProceedings paper