Protective films formed during the etching of TiSi2 and CoSi2 in F-based plasmas

Baklanov, MikhaïlMikhaïlBaklanovVanhaelemeersch, SergeSergeVanhaelemeerschStorm, WolfgangWolfgangStormVandervorst, WilfriedWilfriedVandervorstMaex, KarenKarenMaex2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1073Protective films formed during the etching of TiSi2 and CoSi2 in F-based plasmasOral presentation