Delabie, AnneliesAnneliesDelabieSioncke, SonjaSonjaSionckeRip, JensJensRipVan Elshocht, SvenSvenVan ElshochtPourtois, GeoffreyGeoffreyPourtoisMueller, MatthiasMatthiasMuellerBeckhoff, BurkhardBurkhardBeckhoffPierloot, KristineKristinePierloot2021-10-202021-10-2020120734-2101https://imec-publications.be/handle/20.500.12860/20582Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substratesJournal article