Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33

Kovalevich, TatianaTatianaKovalevichPellens, NickNickPellensLibeert, GuillaumeGuillaumeLibeertVan Look, LieveLieveVan LookFrommhold, AndreasAndreasFrommholdPhilipsen, VickyVickyPhilipsenAbe, TsukasaTsukasaAbeFujimura, YukihiroYukihiroFujimuraHotei, IzumiIzumiHoteiEbisawa, MeiMeiEbisawaYamaji, MasatakaMasatakaYamajiTomizuka, ShosukeShosukeTomizukaYoshikawa, ShingoShingoYoshikawa2026-03-312026-03-312025978-1-5106-9320-30277-786Xhttps://imec-publications.be/handle/20.500.12860/58978engAlternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33Proceedings paper10.1117/12.3071379WOS:001674167600036