Source-mask optimization incorporating a physical resist model and manufacturability constraints

Mulders, ThomasThomasMuldersDomnenko, VitaliyVitaliyDomnenkoKuechler, BerndBerndKuechlerStock, Hans-JuergenHans-JuergenStockKlostermann, UlrichUlrichKlostermannDe Bisschop, PeterPeterDe Bisschop2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21174Source-mask optimization incorporating a physical resist model and manufacturability constraintsProceedings paper