Nucleation and growth mechanism for atomic layer deposition of Al2O3 on two-dimensional WS2 monolayer

Lee, Tsu-TingTsu-TingLeeChiranjeevulu, KashiKashiChiranjeevuluPedaballi, SireeshaSireeshaPedaballiCott, DaireDaireCottDelabie, AnneliesAnneliesDelabieDee, Chang-FuChang-FuDeeChang, Edward YiEdward YiChang2023-06-302022-12-172023-06-3020230734-2101WOS:000892343300001https://imec-publications.be/handle/20.500.12860/40884Nucleation and growth mechanism for atomic layer deposition of Al2O3 on two-dimensional WS2 monolayerJournal article10.1116/6.0001913WOS:000892343300001TRANSITION-METAL DICHALCOGENIDESZIRCONIUM-OXIDEMOS2DIELECTRICSHAFNIUMFILMSMODEBULK