CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques

Vandenberghe, GeertGeertVandenbergheMarschner, ThomasThomasMarschnerRonse, KurtKurtRonseSocha, R.R.SochaDusa, M.M.Dusa2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3952CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniquesProceedings paper