A comparative study of copper drift diffusion in plasma deposited a-SiC : H and Silicon Nitride

Lanckmans, FilipFilipLanckmansGray, WilliamWilliamGrayBrijs, BertBertBrijsMaex, KarenKarenMaex2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5429A comparative study of copper drift diffusion in plasma deposited a-SiC : H and Silicon NitrideJournal article