Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substrates

Van Elshocht, SvenSvenVan ElshochtCaymax, MattyMattyCaymaxConard, ThierryThierryConardDe Gendt, StefanStefanDe GendtHoflijk, IlseIlseHoflijkHoussa, MichelMichelHoussaLeys, FrederikFrederikLeysBonzom, RenaudRenaudBonzomDe Jaeger, BriceBriceDe JaegerVan Steenbergen, JanJanVan SteenbergenVandervorst, WilfriedWilfriedVandervorstHeyns, MarcMarcHeynsMeuris, MarcMarcMeuris2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11390Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substratesProceedings paper