Xu, DongboDongboXuRio, DavidDavidRioGillijns, WernerWernerGillijnsDelorme, MaxMaxDelormeBaerts, ChristinaChristinaBaertsFelix, NelsonLio, Anna2022-06-242021-11-022022-05-172022-06-242021-02-22978-1-5106-4051-10277-786XWOS:000672825700035https://imec-publications.be/handle/20.500.12860/37677NXE:3400 OPC Process Monitoring: Model Validity vs. Process VariabilityProceedings paper10.1117/12.2583870978-1-5106-4052-8WOS:000672825700035Neurosciences & psychopharmacologyDesign Rule, Design Retarget, EUV Lithography, NTD Process, EUV Single Patterning