Kunnen, EddyEddyKunnenVaglio Pret, AlessandroAlessandroVaglio PretLuere, OlivierOlivierLuereAzarnouche, LaurentLaurentAzarnouchePargon, ErwineErwinePargonFoubert, PhilippePhilippeFoubertGronheid, RoelRoelGronheidShamiryan, DenisDenisShamiryanBaklanov, MikhaïlMikhaïlBaklanovBoullart, WernerWernerBoullart2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17410Smoothening of 193 immersion resist by 172 nm VUV exposureMeeting abstract