Controlling scratching in Cu Cchemical-mechanical planarization (CuCMP)

Eusner, ThorThorEusnerSaka, N.N.SakaChun, J-HJ-HChunArmini, SilviaSilviaArminiMoinpour, M.M.MoinpourFisher, P.P.Fisher2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13708Controlling scratching in Cu Cchemical-mechanical planarization (CuCMP)Meeting abstracthttp://www.electrochem.org/meetings/biannual/214/214.htm