Atomic layer deposition of hafnium oxide on Ge and GaAs substrates: precursors and surface preparation

Delabie, AnneliesAnneliesDelabieBrunco, DavidDavidBruncoConard, ThierryThierryConardFavia, PaolaPaolaFaviaBender, HugoHugoBenderFranquet, AlexisAlexisFranquetSioncke, SonjaSonjaSionckeVandervorst, WilfriedWilfriedVandervorstVan Elshocht, SvenSvenVan ElshochtHeyns, MarcMarcHeynsMeuris, MarcMarcMeurisKim, EunjiEunjiKimMcIntyre, Paul C.Paul C.McIntyreSaraswat, Krishna C.Krishna C.SaraswatLeBeau, James M.James M.LeBeauCagnon, JoelJoelCagnonStemmer, SusanneSusanneStemmerTsai, WilmanWilmanTsai2021-10-172021-10-1720080013-4651https://imec-publications.be/handle/20.500.12860/13649Atomic layer deposition of hafnium oxide on Ge and GaAs substrates: precursors and surface preparationJournal article