Altamirano Sanchez, EfrainEfrainAltamirano SanchezTao, ZhengZhengTaoGunay Demirkol, AnilAnilGunay DemirkolLorusso, GianGianLorussoHopf, TobyTobyHopfEveraert, Jean-LucJean-LucEveraertSobieski, DanielDanielSobieskiOu, Fung SuongFung SuongOuHellin, DavidDavidHellinClark, WilliamWilliamClark2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26286Self-aligned-quadruple-patterning for N7/N5 silicon finsProceedings paperhttp://spie.org/newsroom/6378-self-aligned-quadruple-patterning-to-meet-requirements-for-fins-with-high-density