Shirotori, AkihideAkihideShirotoriHoshino, ManabuManabuHoshinoFujimura, MakotoMakotoFujimuraYeh, Sin FuSin FuYehSuh, Hyo SeonHyo SeonSuhDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenbergheSanuki, HideakiHideakiSanuki2024-04-082023-07-282024-04-082023978-1-5106-6103-50277-786XWOS:001022961000002https://imec-publications.be/handle/20.500.12860/42236Development on main chain scission resists for high-NA EUV lithographyProceedings paper10.1117/12.2657506978-1-5106-6104-2WOS:001022961000002