Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch

Mailfert, JulienJulienMailfertVan de Kerkhove, JeroenJeroenVan de KerkhoveDe Bisschop, PeterPeterDe BisschopDe Meyer, KristinKristinDe Meyer2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24181Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etchProceedings paperhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2046782