Development of post InGaAs CMP cleaning process for sub 10nm device application

Purushothaman, MuthukrishnanMuthukrishnanPurushothamanChoi, In-ChanIn-ChanChoiKim, Hyun-TaeHyun-TaeKimTeugels, LieveLieveTeugelsKim, Tae-GonTae-GonKimPark, Jin-GooJin-GooPark2021-10-242021-10-242017-10https://imec-publications.be/handle/20.500.12860/29230Development of post InGaAs CMP cleaning process for sub 10nm device applicationProceedings paper