Baklanov, MikhaïlMikhaïlBaklanovShamiryan, DenisDenisShamiryanBeyer, GeraldGeraldBeyerConard, ThierryThierryConardVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaex2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5038Characterisation of Cu surface cleaning by downstream N2/H2 plasmaProceedings paper