High resolution depth profiling of future gate dielectric materials

Bergmaier, A.A.BergmaierDollinger, G.G.DollingerGörgens, L.L.GörgensNeumaier, P.P.NeumaierBender, HugoHugoBenderBrijs, BertBertBrijsConard, ThierryThierryConardHoussiau, L.L.Houssiau2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7201High resolution depth profiling of future gate dielectric materialsOral presentation