The etching behavior of tungsten (w) with respect to the orientation of the grain boudnary and masking layers

Vanhaelemeersch, SergeSergeVanhaelemeerschVan den hove, LucLucVan den hoveLee, Hean-ChealHean-ChealLee2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/2268The etching behavior of tungsten (w) with respect to the orientation of the grain boudnary and masking layersOral presentation