Comparison of defects created by plasma-based ion implantation and conventional implantation of hydrogen in germanium

David, M.L.M.L.DavidPailloux, F.F.PaillouxDrouet, M.M.DrouetBeaufort, M.F.M.F.BeaufortBarbot, J.F.J.F.BarbotSimoen, EddyEddySimoenClaeys, CorCorClaeys2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13589Comparison of defects created by plasma-based ion implantation and conventional implantation of hydrogen in germaniumProceedings paper