A new method for the production of ultra-thin crystalline Si wafers

Dross, FredericFredericDrossMilhe, AurelienAurelienMilheRobbelein, JoJoRobbeleinGordon, IvanIvanGordonBouchard, Pierre-OlivierPierre-OlivierBouchardBeaucarne, GuyGuyBeaucarnePoortmans, JefJefPoortmans2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12102A new method for the production of ultra-thin crystalline Si wafersProceedings paper