Wet-chemical approaches for atomic layer etching of semiconductors: surface chemistry, oxide removal and reoxidation of InAs (100)

van Dorp, DennisDennisvan DorpArnauts, SophiaSophiaArnautsHolsteyns, FrankFrankHolsteynsDe Gendt, StefanStefanDe Gendt2021-10-232021-10-2320152162-8769https://imec-publications.be/handle/20.500.12860/26053Wet-chemical approaches for atomic layer etching of semiconductors: surface chemistry, oxide removal and reoxidation of InAs (100)Journal articlehttp://jss.ecsdl.org/content/4/6/N5061.abstract