Franquet, AlexisAlexisFranquetTsvetanova, DianaDianaTsvetanovaConard, ThierryThierryConardVos, RitaRitaVosVereecke, GuyGuyVereeckeMertens, PaulPaulMertensHeyns, MarcMarcHeynsVandervorst, WilfriedWilfriedVandervorst2021-10-192021-10-1920110167-9317https://imec-publications.be/handle/20.500.12860/18932ToFSIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresistJournal article