Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source

Dorney, KevinKevinDorneyCastellanos, SoniaSoniaCastellanosWitting Larsen, EsbenEsbenWitting LarsenHolzmeier, FabianFabianHolzmeierSingh, Dhirendra PratapDhirendra PratapSinghVandenbroeck, NadiaNadiaVandenbroeckDe Simone, DaniloDaniloDe SimoneDe Schepper, PeterPeterDe SchepperVaglio Pret, AlessandroAlessandroVaglio PretBargsten, ClaytonClaytonBargstenCousin, SethSethCousinRaymondson, DaisyDaisyRaymondsonRinard, EricEricRinardWard, RodRodWardKapteyn, HenryHenryKapteynNuytten, ThomasThomasNuyttenvan der Heide, PaulPaulvan der HeidePetersen, JohnJohnPetersen2021-10-312021-10-312021https://imec-publications.be/handle/20.500.12860/36683Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV SourceProceedings paper