Improving CMOS performance by AVD® grown high-k dielectrics and advanced metal electrodes

Weber, U.U.WeberBoissière, O.O.BoissièreLindner, J.J.LindnerSchuhmacher, M.M.SchuhmacherLehnen, PeerPeerLehnenManke, C.C.MankeVan Elshocht, SvenSvenVan ElshochtCaymax, MattyMattyCaymaxCosnier, V.V.CosnierMcEntee, T.T.McEntee2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11548Improving CMOS performance by AVD® grown high-k dielectrics and advanced metal electrodesProceedings paper