Braginsky, O.V.O.V.BraginskyKovalev, A.S.A.S.KovalevLopaev, D.V.D.V.LopaevMalykhin, E.M.E.M.MalykhinMankelevich, Y.A.Y.A.MankelevichRakhimova, T.V.T.V.RakhimovaRakhimov, A.T.A.T.RakhimovVasilieva, A.N.A.N.VasilievaZyryanov, S.M.S.M.ZyryanovBaklanov, MikhaïlMikhaïlBaklanov2021-10-182021-10-1820100021-8979https://imec-publications.be/handle/20.500.12860/16795The mechanism of low-k SiOCH film modification by oxygen atomsJournal article