Zhao, ChaoChaoZhaoVan Elshocht, SvenSvenVan ElshochtConard, ThierryThierryConardXu, ZhenZhenXuRichard, OlivierOlivierRichardCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9979HfO2 and HfSixOyNz high-k layers deposited by MOCVD in mixed gas flows of N2O and O2Proceedings paper