Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process

Ishimoto, ToruToruIshimotoIsawa, MikiMikiIsawaTanaka, MakiMakiTanakaCheng, ShauneeShauneeCheng2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19109Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography processProceedings paper