Loo, RogerRogerLooVincent, BenjaminBenjaminVincentHikavyy, AndriyAndriyHikavyyGencarelli, FedericaFedericaGencarelliEneman, GeertGeertEnemanWitters, LiesbethLiesbethWittersMitard, JeromeJeromeMitardHellings, GeertGeertHellingsSioncke, SonjaSonjaSionckeBender, HugoHugoBenderEyben, PierrePierreEybenCaymax, MattyMattyCaymaxVandervorst, WilfriedWilfriedVandervorstThean, AaronAaronThean2021-10-202021-10-202012-09https://imec-publications.be/handle/20.500.12860/21059Epitaxial growth in advanced SiGe and Ge MOS devices: challenges and solutionsProceedings paper