Van Driessche, VeerleVeerleVan DriesscheLucas, KevinKevinLucasVan Roey, FriedaFriedaVan RoeyGrozev, GrozdanGrozdanGrozevTzviatkov, PlamenPlamenTzviatkov2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6934100-nm generation contact patterning by low temperature 193-nm resist reflow processProceedings paper