Functional water solutions to enable wet cleaning process for leading edge semiconductor device manufacturing

Kesters, ElsElsKestersHideaki, IinoIinoHideakiYuichi, OgawaOgawaYuichiOniki, YusukeYusukeOnikiLe, Quoc ToanQuoc ToanLeHolsteyns, FrankFrankHolsteyns2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/33267Functional water solutions to enable wet cleaning process for leading edge semiconductor device manufacturingMeeting abstract