Relation between oxide-CMP induced defects and post-CMP cleaning strategies

Devriendt, KatiaKatiaDevriendtVrancken, EviEviVranckenHeylen, NancyNancyHeylenGrillaert, JoostJoostGrillaertMeuris, MarcMarcMeurisHeyns, MarcMarcHeynsLing, Zhi MingZhi MingLing2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3418Relation between oxide-CMP induced defects and post-CMP cleaning strategiesProceedings paper