Optimization of external poly base sheet resistance in 0.13um quasi self-aligned SiGe:C HBTs

You, ShuzhenShuzhenYouVan Huylenbroeck, StefaanStefaanVan HuylenbroeckNguyen, DuyDuyNguyenSibaja-Hernandez, ArturoArturoSibaja-HernandezVenegas, RafaelRafaelVenegasVan Wichelen, KoenKoenVan WichelenDecoutere, StefaanStefaanDecoutereDe Meyer, KristinKristinDe Meyer2021-10-192021-10-1920100040-6090https://imec-publications.be/handle/20.500.12860/18397Optimization of external poly base sheet resistance in 0.13um quasi self-aligned SiGe:C HBTsJournal articlehttp://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW0-4XGPKGB-J&_user=799533&_coverDate=01%2F01%2F2010&_rdoc=1&_fmt=&_o