CD control using SiON BARL processing for sub-0.25μm lithography

Zhang, FenghongFenghongZhangOp de Beeck, MaaikeMaaikeOp de BeeckSchaekers, MarcMarcSchaekersRonse, KurtKurtRonseConley, W.W.ConleyGopalan, P.P.GopalanGangala, Hareen KHareen KGangalaDusa, M.M.DusaBendik, JoeJoeBendik2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/4044CD control using SiON BARL processing for sub-0.25μm lithographyJournal article