In-situ oxygen monitoring of rapid thermal process chamber: diagnosis of gas flow dynamics and wafer processing

Kondoh, EiichiEiichiKondohMaex, KarenKarenMaex2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/1971In-situ oxygen monitoring of rapid thermal process chamber: diagnosis of gas flow dynamics and wafer processingProceedings paper