Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

Xu, DongboDongboXuGillijns, WernerWernerGillijnsTan, Ling EeLing EeTanRio, DavidDavidRioDelorme, MaxMaxDelormePhilipsen, VickyVickyPhilipsenKim, Ryan Ryoung hanRyan Ryoung hanKim2023-03-232023-03-012023-03-022023-03-232022-11-251932-5150WOS:000924949300020https://imec-publications.be/handle/20.500.12860/41205Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n maskJournal article10.1117/1.JMM.21.4.043202WOS:000924949300020