Process development for a novel low loss and non-PFAS photo imageable dielectric for RF silicon interposer applications

Jafarpoorchekab, HamidehHamidehJafarpoorchekabSun, XiaoXiaoSunUruena, AngelAngelUruenaSinha, SiddharthaSiddharthaSinhaPinho, NelsonNelsonPinhoMiller, AndyAndyMillerCollaert, NadineNadineCollaert2025-06-302025-06-212025-06-302024979-8-3315-1651-22164-0157WOS:001460256800021https://imec-publications.be/handle/20.500.12860/45818Process development for a novel low loss and non-PFAS photo imageable dielectric for RF silicon interposer applicationsProceedings paper10.1109/3DIC63395.2024.10830178979-8-3315-1650-5WOS:001460256800021WAVE PHASED-ARRAYS