On the diffusion process of electronically active defects in amorphous HfOx

Clima, SergiuSergiuClimaChen, YangyinYangyinChenGovoreanu, BogdanBogdanGovoreanuJurczak, GosiaGosiaJurczakAltimime, LaithLaithAltimimePourtois, GeoffreyGeoffreyPourtois2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20482On the diffusion process of electronically active defects in amorphous HfOxProceedings paper