Stepanenko, NickolayNickolayStepanenkoKishimura, ShinjiShinjiKishimuraGronheid, RoelRoelGronheidMaenhoudt, MireilleMireilleMaenhoudtErcken, MoniqueMoniqueErckenKocsis, MichaelMichaelKocsisVandenbroeck, NadiaNadiaVandenbroeckVan Den Heuvel, DieterDieterVan Den HeuvelBenndorf, MichaelMichaelBenndorf2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11271Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithographyProceedings paper